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Effect of GaN template thickness and morphology on AlxGa1-xN (0Identifieur interne : 000F12 ( Main/Repository ); précédent : 000F11; suivant : 000F13

Effect of GaN template thickness and morphology on AlxGa1-xN (0Auteurs : RBID : Pascal:13-0251386

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English descriptors

Abstract

We have grown AlxGa1-xN/GaN (00.07Ga0.93N samples grown on different GaN templates have been studied. The HRXD and the AFM results show a better film quality when the AlGaN layer is grown on a 1.3 μm-thick 2D GaN template. It is possible to control the stress in the layers. The crystalline quality is also showed to degrade with Al solid content increase.

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<term>Indium nitride</term>
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<div type="abstract" xml:lang="en">We have grown Al
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N samples grown on different GaN templates have been studied. The HRXD and the AFM results show a better film quality when the AlGaN layer is grown on a 1.3 μm-thick 2D GaN template. It is possible to control the stress in the layers. The crystalline quality is also showed to degrade with Al solid content increase.</div>
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<sub>x</sub>
Ga
<sub>1-x</sub>
N/GaN (0<sub>0.07</sub>
Ga
<sub>0.93</sub>
N samples grown on different GaN templates have been studied. The HRXD and the AFM results show a better film quality when the AlGaN layer is grown on a 1.3 μm-thick 2D GaN template. It is possible to control the stress in the layers. The crystalline quality is also showed to degrade with Al solid content increase.</s0>
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<s5>19</s5>
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<s4>INC</s4>
<s5>32</s5>
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<s5>33</s5>
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<s4>INC</s4>
<s5>34</s5>
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<fC03 i1="17" i2="3" l="FRE">
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<s5>35</s5>
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<s5>62</s5>
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<s5>62</s5>
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